A high-numerical aperture extreme-ultraviolet (NA EUV) lithography center is set to be built at the NanoTech Complex semiconductor research facility in Albany, N.Y.
The state of New York partnered with IBM, Micron, Applied Materials, and Tokyo Electron, among others, to invest in expanding NY CREATES’ Albany NanoTech Complex where IBM is one of the key members.
The $10 billion investment will lead to the first and only publicly owned high NA EUV center in North America.
From right: IBM CEO Arvind Krishna, U.S. Sen. Chuck Schumer, N.Y. Gov. Kathy Hochul, and leaders from the semiconductor industry at the announcement of the high NA EUV center. Courtesy of Mike Groll/Office of Gov. Kathy Hochul. The initiative, which...
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